- Our First Open House Webinar March 9, 2010 Russ
- In His Grip, Nanette Bartet March 8, 2010 Tamaree
- Blow Out! The Silicone Carbide Crunch March 8, 2010 Russ
Photo Resist Developing and Washout Process
January 19th, 2010 | 
Author: Photo Resist Developing and Washout Process
Profitable Hobbies photo resist developing and washout process makes it a breeze to transfer your artwork onto photo resist film for micro sandblasting projects. No hand cutting of stencils, ever. Artwork patterns are transferred onto photo resist film using ultra violet light – it’s quick and easy and the results are perfect, every time. The ParaBlaster is a great way to produce perfect sandblasting results without being an artist.
Robert Lee has made a video of the entire photo resist developing and washout process that he uses with The ParaBlaster for micro sandblasting projects. He has been kind enough to share this process with all of us.
Watch the video below to see the process…..
Robert starts with a black and white pattern (already on transparency film) and shows us how he develops the pattern using our ultra violet exposure light. This transfers the exact pattern onto the photo resist film (no hand cutting) for blasting. He then walks us through the washout process which “cures” the photo resist film and prepares our image for sandblasting.
Once the resist is dry, it is ready to be placed onto your project to be sand blasted. Many different surfaces can be sandblasted including glass, stone, tile, metal and more. The ParaBlaster is great for high run projects, too.
To learn more about Micro Sandblasting and The ParaBlaster, join us for a Free Webinar presented by The I&E Network on Wednesday, January 20, 2010 at 7:00 p.m. MST.
Register for the FREE Webinar – Click Here.
Jack Short will be showing us how he produces his sandblasting projects on glass using The ParaBlaster.
Register Now for Jack’s Micro Sandblasting Webinar – It’s FREE!
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This was very good. I do have a couple of questions. I was informed at one time that you just let the light on for 14 to 15 sec. Also I have alwasy just taped it on a paper towel to get excess water off instead of drying it with a hair dryer. Which would be the best? Just clicking the light two times sure seems easier then having to watch my second hand for the time.
Joanie, The time that you expose the photo resist for varies depending on the paper you have your pattern on and the darkness of the design you are developing. I prefer to put my artwork on clear transparencies, doubled up and taped together, so the artwork if very dark. Others choose to use vellum and only use a single sheet. You need to experiment a little bit with the time to get it just right for you. Exposure times can vary between 15 seconds and 30 seconds. There is no EXACT time for everyone. Also, there is no set way to get the excess water off – Robert showed us how he does it. Personally, I just blog with a clean towel, blot not rub. As far as the light goes, I think it is safer to time it myself, but again – make sure you test it for yourself.
Russ